Ultralow-energy focused electron beam induced deposition

Hoyle, P.C.; Cleaver, J.R.A.; Ahmed, H.
March 1994
Applied Physics Letters;3/14/1994, Vol. 64 Issue 11, p1448
Academic Journal
Examines the focused electron beam induced deposition from W(CO)[sub 6] at beam primary energies. Maintenance of submicrometer resolution at very low primary energies using a retarding field configuration; Implication of deposit resistivity for metallic content; Use for repairing clear defects on x-ray masks and making semiconductor tracks.


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