Optical and electrical properties of titanium dioxide films with a high magnitude dielectric

Kim, T.W.; Jung, M.; Kim, H.J.; Park, T.H.; Yoon, Y.S.; Kang, W.N.; Yom, S.S.; Na, H.K.
March 1994
Applied Physics Letters;3/14/1994, Vol. 64 Issue 11, p1407
Academic Journal
Examines the optical and electrical properties of titanium dioxide thin films with high magnitude dielectric constant grown on p-silicon by metalorganic chemical vapor deposition at low temperature. Surface morphology; Use of x-ray diffraction analysis and Raman spectroscopy; Film stoichiometry.


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