TITLE

Self-limiting oxidation for fabricating sub-5 nm silicon nanowires

AUTHOR(S)
Liu, H.I.; Biegelsen, D.K.; Ponce, F.A.; Johnson, N.M.; Pease, R.F.W.
PUB. DATE
March 1994
SOURCE
Applied Physics Letters;3/14/1994, Vol. 64 Issue 11, p1383
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the techniques for fabricating sub-five nanometer silicon nanowires. Use of the materials for analysis of optical and electrical properties; Characterization of fabricated structures by transmission electron microscopy; Mechanism of the self-limiting oxidation phenomenon of the nanostructures.
ACCESSION #
4289586

 

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