TITLE

Reflection high-energy electron diffraction intensity oscillations during the growth by

AUTHOR(S)
Fahy, M.R.; Sato, K.; Joyce, B.A.
PUB. DATE
January 1994
SOURCE
Applied Physics Letters;1/10/1994, Vol. 64 Issue 2, p190
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the reflection high-energy electron diffraction intensity oscillations during the growth of gallium arsenide (GaAs) by molecular beam epitaxy. Difference in the growth orientation between Ga and As beams; Regulation of substrate preparation to guarantee reproducibility; Involvement of dissociation in the growth process.
ACCESSION #
4289540

 

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