Preparation of aluminum nitride thin films by reactive sputtering and their applications to

Okano, Hiroshi; Tanaka, Naoki; Takahashi, Yusuke; Tanaka, Toshiharu; Shibata, Kenichi; Nakano, Shoichi
January 1994
Applied Physics Letters;1/10/1994, Vol. 64 Issue 2, p166
Academic Journal
Prepares single crystal aluminum nitride thin films by low-temperature reactive sputtering. Charactersistics of surface acoustic waves; Phase velocity and temperature coefficient of the delay time; Consideration of the film plasma stability and sputtering conditions.


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