TITLE

Preparation of aluminum nitride thin films by reactive sputtering and their applications to

AUTHOR(S)
Okano, Hiroshi; Tanaka, Naoki; Takahashi, Yusuke; Tanaka, Toshiharu; Shibata, Kenichi; Nakano, Shoichi
PUB. DATE
January 1994
SOURCE
Applied Physics Letters;1/10/1994, Vol. 64 Issue 2, p166
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Prepares single crystal aluminum nitride thin films by low-temperature reactive sputtering. Charactersistics of surface acoustic waves; Phase velocity and temperature coefficient of the delay time; Consideration of the film plasma stability and sputtering conditions.
ACCESSION #
4289532

 

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