Maskless writing of submicrometer gratings in fused silica by focused ion beam implantation and

Albert, J.; Hill, K.O.; Malo, B.; Johnson, D.C.; Bilodeau, F.
October 1993
Applied Physics Letters;10/25/1993, Vol. 63 Issue 17, p2309
Academic Journal
Investigates the fabrication of surface relief gratings with submicrometer periods in fused silica. Use of ion beam implantation and differential wet etching methods in defining useful grooved patterns in silica flats; Comparison of the groove depths and etches of implanted and unimplanted silica; Features of the technique.


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