TITLE

Maskless writing of submicrometer gratings in fused silica by focused ion beam implantation and

AUTHOR(S)
Albert, J.; Hill, K.O.; Malo, B.; Johnson, D.C.; Bilodeau, F.
PUB. DATE
October 1993
SOURCE
Applied Physics Letters;10/25/1993, Vol. 63 Issue 17, p2309
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the fabrication of surface relief gratings with submicrometer periods in fused silica. Use of ion beam implantation and differential wet etching methods in defining useful grooved patterns in silica flats; Comparison of the groove depths and etches of implanted and unimplanted silica; Features of the technique.
ACCESSION #
4289475

 

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