TITLE

Reliability of the electrical properties of the BF[sup +][sub 2] ion implanted polycrystalline

AUTHOR(S)
Lee, S.L.; Lin, S.J.; Hwang, J.
PUB. DATE
July 1993
SOURCE
Applied Physics Letters;7/26/1993, Vol. 63 Issue 4, p524
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the electrical properties of the boron fluorine[sup +][sub 2] ion implanted polycrystalline diamond thin film. Effect of gas exposure on the resistance of implanted diamond film; Deposition of film by a microwave plasma-assisted chemical vapor deposition method; Reliance of film resistance on temperatures.
ACCESSION #
4289460

 

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