TITLE

Control of selectivity during chemical vapor deposition of copper from copper (I) compounds via

AUTHOR(S)
Jain, A.; Farkas, J.; Kodas, T.T.; Chi, K.-M.; Hampden-Smith, M.J.
PUB. DATE
November 1992
SOURCE
Applied Physics Letters;11/30/1992, Vol. 61 Issue 22, p2662
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the selective chemical vapor deposition of copper (Cu) from copper (I) compounds via silicon dioxide (SiO[sub 2]) surface modification. List of the compounds used; Analysis of the compounds as a function of surface pretreatment; Factors responsible for the control of Cu nucleation onto SiO[sub 2].
ACCESSION #
4289404

 

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