TITLE

Elastic misfit stress relaxation in heteroepitaxial SiGe/Si mesa structures

AUTHOR(S)
Fischer, A.; Richter, H.
PUB. DATE
November 1992
SOURCE
Applied Physics Letters;11/30/1992, Vol. 61 Issue 22, p2656
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Analyzes the elastic misfit stress relaxation in heteroepitaxial silicon germanide (SiGe)/Si mesa structures. Calculation of the misfit stress distribution versus distance from the free surface of the mesa edge; Determination of biaxial misfit stress distribution; Variation of stress values as a function of material and size characteristics of the layer-substrate.
ACCESSION #
4289402

 

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