Elastic misfit stress relaxation in heteroepitaxial SiGe/Si mesa structures

Fischer, A.; Richter, H.
November 1992
Applied Physics Letters;11/30/1992, Vol. 61 Issue 22, p2656
Academic Journal
Analyzes the elastic misfit stress relaxation in heteroepitaxial silicon germanide (SiGe)/Si mesa structures. Calculation of the misfit stress distribution versus distance from the free surface of the mesa edge; Determination of biaxial misfit stress distribution; Variation of stress values as a function of material and size characteristics of the layer-substrate.


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