Delineation of semiconductor doping by scanning resistance microscopy

Shafai, C.; Thomson, D.J.
January 1994
Applied Physics Letters;1/17/1994, Vol. 64 Issue 3, p342
Academic Journal
Examines the delineation of semiconductor junctions. Use of scanning resistance microscopy (SRM) in delineation; Application of conducting probe by SRM to measure localized surface resistance; Importance of measurements in doping type and concentration delineation; Correlation between resistance and surface topography measurements.


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