TITLE

Oxidation of polycrystalline-SiGe alloys

AUTHOR(S)
Tsutsu, H.; Edwards, W.J.
PUB. DATE
January 1994
SOURCE
Applied Physics Letters;1/17/1994, Vol. 64 Issue 3, p297
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the oxidation of polycrystalline-SiGe alloys. Use of wet oxidation with trichloroethane on polycrystalline-SiGe (poly-SiGe) films; Effect of germanium (Ge) concentration on poly-SiGe oxidation rate; Function of Rutherford backscattering spectra in depicting Ge diffusion into poly-SiGe layer; Impact of Ge rejection on oxide composition.
ACCESSION #
4284399

 

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