Generation of electrochemically deposited metal patterns by means of electron beam

Sondag-Huethorst, J.A.M.; van Helleputte, H.R.J.
January 1994
Applied Physics Letters;1/17/1994, Vol. 64 Issue 3, p285
Academic Journal
Examines the production of submicron metal patterns by galvanic deposition in monolayer resist openings. Use of electron beam lithography in metal pattern generation; Indication of docosanethiol layer adsorption on gold in monolayer resist; Role of positive resist pattern in copper deposition; Effect of deposition time on Cu pattern size.


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