TITLE

Generation of electrochemically deposited metal patterns by means of electron beam

AUTHOR(S)
Sondag-Huethorst, J.A.M.; van Helleputte, H.R.J.
PUB. DATE
January 1994
SOURCE
Applied Physics Letters;1/17/1994, Vol. 64 Issue 3, p285
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the production of submicron metal patterns by galvanic deposition in monolayer resist openings. Use of electron beam lithography in metal pattern generation; Indication of docosanethiol layer adsorption on gold in monolayer resist; Role of positive resist pattern in copper deposition; Effect of deposition time on Cu pattern size.
ACCESSION #
4284395

 

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