Surface reactions driven by cluster impact: Oxidation of Si(111) by (O[sub 2])[sup +, sub n]

Klopcic, Stephan A.; Jarrold, Martin F.
June 1997
Journal of Chemical Physics;6/1/1997, Vol. 106 Issue 21, p8855
Academic Journal
Examines the oxidation of room temperature silicon by oxygen clusters by x-ray photoelectron spectroscopy. Impact of an oxygen cluster on clean silicon on various temperature ranges; Formation of suboxide and oxides; Number of silicon atoms oxidized per cluster impact.


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