TITLE

Generation of high-peak pulse beam of hydrogen plasma for use in short-pulsed chemical beam epitaxy

AUTHOR(S)
Ozasa, Kazunari; Aoyagi, Yoshinobu
PUB. DATE
April 1994
SOURCE
Applied Physics Letters;4/25/1994, Vol. 64 Issue 17, p2220
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the generation of high-peak pulse beam of hydrogen plasma for semiconductor crystal growth application. Factors attributed to the increase in plasma intensity; Linear correlation between plasma intensity and hydrogen supply; Examination of crystal growth in the short-pulsed chemical beam epitaxy of aluminum arsenide.
ACCESSION #
4272558

 

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