Generation of high-peak pulse beam of hydrogen plasma for use in short-pulsed chemical beam epitaxy

Ozasa, Kazunari; Aoyagi, Yoshinobu
April 1994
Applied Physics Letters;4/25/1994, Vol. 64 Issue 17, p2220
Academic Journal
Examines the generation of high-peak pulse beam of hydrogen plasma for semiconductor crystal growth application. Factors attributed to the increase in plasma intensity; Linear correlation between plasma intensity and hydrogen supply; Examination of crystal growth in the short-pulsed chemical beam epitaxy of aluminum arsenide.


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