Randomly oriented Angstrom-scale microroughness at the Si(100)/SiO[sub 2] interface probed by

Dadap, J.I.; Doris, B.
April 1994
Applied Physics Letters;4/18/1994, Vol. 64 Issue 16, p2139
Academic Journal
Examines the microroughness at silicon/silicon dioxide interface through optical second harmonic generation. Use of titanium:sapphire laser to generate second harmonic (SH) signals; Details on anisotropic oscillation amplitude of the etched surface; Effects of interfacial microroughness on second harmonic generation.


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