Improved process for liquid phase deposition of silicon dioxide

Jeng-Shiuh Chou; Si-Chen Lee
April 1994
Applied Physics Letters;4/11/1994, Vol. 64 Issue 15, p1971
Academic Journal
Develops a process for liquid phase deposition of silicon dioxide (SiO[sub 2]). Use of silicic acid to saturate hydrofluorosilic (HF) acid at specific temperature; Role of water as boric acid to reduce the concentration of HF in the solution; Growth rate of SiO[sub 2].


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