TITLE

Ion trajectory distortion and profile tilt by surface charging in plasma etching

AUTHOR(S)
Murakawa, Shigemi; Sychyi Fang
PUB. DATE
March 1994
SOURCE
Applied Physics Letters;3/21/1994, Vol. 64 Issue 12, p1558
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the surface charging effects on etching profiles during silicon etching in a nonuniform plasma. Calculation of the distortion in ion trajectories; Appearance of a tilt in the etching profile in holes and trenches near a large etched ares; Enhancement of the plasma nonuniformity in the north-south direction across the wafer.
ACCESSION #
4272440

 

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