Diffusion barrier effects of transition metals for Cu/M/Si multilayers (M=Cr, Ti, Nb, Mo, Ta, W)

Ono, H.; Nakano, T.
March 1994
Applied Physics Letters;3/21/1994, Vol. 64 Issue 12, p1511
Academic Journal
Investigates the diffusion of copper (Cu) into silicon (Si) through various barrier metals to find diffusion barrier materials for copper. Measurement of copper behavior in Cu/M/Si multilayers; Preservation of the multilayer structures of the Cu/Ta/Si and Cu/W/Si multilayers after annealing; Difference in the barrier properties of the transition metals.


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