TITLE

Degradation mechanisms and improvement of thermal stability of CoSi[sub 2]/polycrystalline Si

AUTHOR(S)
Wei-Ming Chen; Banerjee, Sanjay K.
PUB. DATE
March 1994
SOURCE
Applied Physics Letters;3/21/1994, Vol. 64 Issue 12, p1505
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the degradation mechanisms of cobalt silicide/polycrystalline silicon (polycide) films. Formation of cobalt silicide; Thermal stability of the silicide films; Influence of the microstructure of silicon substrate on the thermal stability of the polycide films; Separation of the effects of substrates and films.
ACCESSION #
4272422

 

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