YBa[sub 2]Cu[sub 3]O[sub 7] nanobridges fabricated by direct-write electron beam lithography

Wendt, J.R.; Martens, J.S.
September 1992
Applied Physics Letters;9/28/1992, Vol. 61 Issue 13, p1597
Academic Journal
Presents a direct method for nondamaging, nanometer-scale patterning of high T[sub c] superconductor thin films. Use of direct-write electron beam lithography in fabricating superconducting nanobridges; Range of critical currents exhibited by functional junctions; Dependence of the critical current on applied magnetic field.


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