TITLE

A 100 kV 10 A high-voltage pulse generator for plasma immersion ion implantation

AUTHOR(S)
Brufscher, Jorg
PUB. DATE
July 1996
SOURCE
Review of Scientific Instruments;Jul96, Vol. 67 Issue 7, p2621
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents the design of a high-voltage pulsing system for a plasma immersion ion implantation (PIII) facility. Electrical model for the plasma; Design of a pulse generator using a tetrode; Performance measurements.
ACCESSION #
4271725

 

Related Articles

  • A scheme of a modular plasma-opening-switch-based generator of megaampere currents for experiments with Z-pinches. Dolgachev, G.; Kalinin, Yu.; Maslennikov, D.; Matveev, V.; Shvedov, A. // Instruments & Experimental Techniques;Jul2013, Vol. 56 Issue 4, p414 

    A modular scheme of a megaampere current pulse generator on the plasma opening switch (POS) basis with insulation of the POS interelectrode gap by a magnetic field created by an external source is proposed for experiments with wire liners and other applications. The POS is fed from independent...

  • Note: Practical monitoring system using characteristic impedance measurement during plasma processing. Motomura, T.; Kasashima, Y.; Fukuda, O.; Uesugi, F.; Kurita, H.; Kimura, N. // Review of Scientific Instruments;2014, Vol. 85 Issue 2, p1 

    A method for characteristic impedance monitoring (CIM) is developed for anomaly detection during plasma processing. Advantages of the method include high-sensitivity and real-time monitoring, as well as structural simplicity to install the measurement system in the mass production equipment. To...

  • Non-conventional high voltage pulsers for advanced plasma immersion ion implantation. Rossi, J. O.; Barroso, J. J.; Ueda, M. // AIP Conference Proceedings;2001, Vol. 563 Issue 1, p96 

    The treatment of surfaces by plasma immersion ion implantation requires pulsed power modulators to provide negative high voltage pulses. In general, the most commonly used modulators consist of either a pulse forming network (PFN) or a hard tube (HT) pulser. For high implant current above 100 A...

  • Distributed electron cyclotron resonance plasma immersion for large area ion implantation (invited). Le Coeur, F.; Brunel, M.; Burke, R.; Lagarde, T.; Arnal, Y.; Pelletier, J. // Review of Scientific Instruments;Feb1998, Vol. 69 Issue 2, p831 

    Describes the plasma specifications needed for plasma-based ion implantation (PBII) processing. Application of negative high voltage pulses to the substrate; Advantages of PBII over ion beam implantation; Comparison between conventional ion implantation and the PBII process; Influence of the...

  • Subnanosecond high-voltage pulse generator. Brown, David; Martin, Don // Review of Scientific Instruments;Aug1987, Vol. 58 Issue 8, p1523 

    We developed a pulse generator that uses high-voltage step recovery diodes to produce 400- to 500-V pulses with rise and fall times of 0.8 ns. The output pulse width is continuously adjustable. For a pulse width of 0.8-ns FWHM, the amplitude into 50 Ω is 400 V. With the pulse-width control...

  • Accurate determination of pulsed current waveform in plasma immersion ion implantation processes. Tian, Xiubo; Tang, Baoyin // Journal of Applied Physics;10/1/1999, Vol. 86 Issue 7, p3567 

    Presents a study which measured the ion current waveform in plasma immersion ion implantation (PIII). Potential application of PIII; Theoretical simulation; Results of the study.

  • Investigation and control of spatial characteristics of chamber-cleaning plasmas. Steffens, Kristen L.; Sobolewski, Mark A. // AIP Conference Proceedings;2001, Vol. 550 Issue 1, p233 

    Planar laser-induced fluorescence (PLIF) measurements were made to determine 2-D spatial maps of CF[sub 2] density as a chemical marker of plasma uniformity in 9% O[sub 2]/91% CF[sub 4] chamber-cleaning plasmas. Measurements were made in the capacitively-coupled Gaseous Electronics Conference...

  • The time-domain triple-probe method. Meier, M.A.; Hallock, G.A.; Tsui, H.Y.W.; Bengtson, Roger D. // Review of Scientific Instruments;Jan1995, Vol. 66 Issue 1, p437 

    Develops a new Langmuir-probe technique based on the triple-probe method to provide simultaneous measurement of plasma temperature potential. Range of differences in the plasma measured at each probe; Introduction of significant error in the estimation of turbulence parameters.

  • Instability heating of a solid fiber Z-pinch. Riley, R.; Scudder, D.; Shlachter, J.; Lovberg, R. // Physics of Plasmas;Apr96, Vol. 3 Issue 4, p1314 

    Studies a dense Z-pinch formed by the electrical breakdown of solid CD[sub2] fibers in an 800 kA, 100 ns risetime pulse generator with optical and radiation diagnostics. Calculations based on classical joule heating of the plasma that predict approximate dynamic equilibrium; Expansion of the...

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics