TITLE

Metal ion beam self-sputter deposition system

AUTHOR(S)
Gotoh, Y.; Amioka, T.; Tsuji, H.; Ishikawa, J.
PUB. DATE
May 1996
SOURCE
Review of Scientific Instruments;May96, Vol. 67 Issue 5, p1996
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Reports on the development of a metal ion beam self-sputter deposition system which requires no gas feeding, for film preparation under ultrahigh vacuum. Metal ion beam self-sputter deposition system; Deposition and characterization of the films; Angular distribution of sputtered particles.
ACCESSION #
4271677

 

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