TITLE

Reduced phosphorus loss from InP surface during hydrogen plasma treatment

AUTHOR(S)
Balasubramanian, Sathya; Kumar, Vikram
PUB. DATE
March 1994
SOURCE
Applied Physics Letters;3/28/1994, Vol. 64 Issue 13, p1696
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Proposes a method for reducing phosphorus (P) loss from the indium phosphide (InP) surface during hydrogen (H) plasma treatment. Suppression of P loss using a sacrificial InP wafer; Reduction of P vacancy related transitions; Use of InP wafer in providing a P overpressure during H plasma treatment.
ACCESSION #
4266608

 

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