TITLE

New microfabrication technique by synchrotron radiation-excited etching: Use of noncontact mask

AUTHOR(S)
Terakado, Shingo; Goto, Takashi
PUB. DATE
March 1994
SOURCE
Applied Physics Letters;3/28/1994, Vol. 64 Issue 13, p1659
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the synchrotron radiation (SR)-excited etching using noncontact mask on a submicrometer scale. Replication of the noncontact mask on the etched surface; Obtainment of the area-selective etching; Determination of the depth profile of the etched part through the photointensity distribution of SR.
ACCESSION #
4266595

 

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