TITLE

Laser dehydrogenation/crystallization of plasma-enhanced chemical vapor deposited amorphous

AUTHOR(S)
Mei, P.; Boyce, J.B.
PUB. DATE
February 1994
SOURCE
Applied Physics Letters;2/28/1994, Vol. 64 Issue 9, p1132
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines a low temperature process for laser dehydrogenation and crystallization of hydrogenated amorphous silicon (a-Si). Integration of a-Si and polycrystalline silicon devices; Advantages of the laser hydrogen removal method for plasma enhanced chemical vapor deposition a-Si:H; Properties of a-Si:H.
ACCESSION #
4266562

 

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