Investigation of the stresses in continuous thin films and patterned lines by x-ray diffraction

Kuschke, W.-M.; Arzt, E.
February 1994
Applied Physics Letters;2/28/1994, Vol. 64 Issue 9, p1097
Academic Journal
Measures the strains and stresses in aluminum thin films and patterned lines using x-ray diffraction. Implications for electromigration resistance; Effects of passivation on films and lines; Difference between the stresses in unpassivated and passivated lines of the same material.


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