On the nature of cross-hatch patterns on compositionally graded Si[sub 1-x]Ge[sub x] alloy layers

Shiryaev, Sergey Yu.; Jensen, Flemming
June 1994
Applied Physics Letters;6/13/1994, Vol. 64 Issue 24, p3305
Academic Journal
Investigates the effect of strain relaxation on the surface morphology of compositionally graded Si[sub 1-x]Ge[sub x] alloy layers. Implication of shear displacement for surface roughness; Formation of dislocation cluster networks; Contribution of surface plastic displacements to cross-hatch pattern formation.


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