TITLE

Change of surface structure of thin silicon nitride layers during electron beam rapid thermal

AUTHOR(S)
Markwitz, A.; Baumann, H.
PUB. DATE
May 1994
SOURCE
Applied Physics Letters;5/16/1994, Vol. 64 Issue 20, p2652
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the surface of silicon nitride (SiN) by electron beam rapid thermal annealing. Investigation of the modification in the surface structure by atomic force microscopy and nuclear reaction analysis; Shift of the low energy edge representing the SiN sample surface; Presence of irregularly distributed vertical structures in the surfaces.
ACCESSION #
4266455

 

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