Synchrotron radiation-excited etching of W, Ta, and their oxide films

Terakado, Shingo; Kaneda, Kazuhiro
February 1994
Applied Physics Letters;2/21/1994, Vol. 64 Issue 8, p1045
Academic Journal
Details the synchrotron radiation-(SR-)excited etching of tungsten, tantalum, and their oxide films. Selectivity of photoexcited etching on radiated region; Effects of reactive species on etching; Examination of the role of SR on etching through surface photochemical reaction.


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