TITLE

Synchrotron radiation-excited etching of W, Ta, and their oxide films

AUTHOR(S)
Terakado, Shingo; Kaneda, Kazuhiro
PUB. DATE
February 1994
SOURCE
Applied Physics Letters;2/21/1994, Vol. 64 Issue 8, p1045
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Details the synchrotron radiation-(SR-)excited etching of tungsten, tantalum, and their oxide films. Selectivity of photoexcited etching on radiated region; Effects of reactive species on etching; Examination of the role of SR on etching through surface photochemical reaction.
ACCESSION #
4266393

 

Related Articles

  • Synchrotron-radiation-induced anisotropic wet etching of GaAs. Qing Ma; Mancini, Derrick C. // Applied Physics Letters;10/11/1999, Vol. 75 Issue 15, p2274 

    Studies a room-temperature photoenhanced chemical wet etching process for n-type GaAs using x-rays from a synchrotron radiation source. Etching solution used; Characteristics of the etched surfaced produced by the process; Dependence of the etching rate on x-ray intensity and energy, solution...

  • Origin of magnetic switching field distribution in bit patterned media based on pre-patterned substrates. Pfau, B.; G√ľnther, C. M.; Guehrs, E.; Hauet, T.; Yang, H.; Vinh, L.; Xu, X.; Yaney, D.; Rick, R.; Eisebitt, S.; Hellwig, O. // Applied Physics Letters;8/8/2011, Vol. 99 Issue 6, p062502 

    Using a combination of synchrotron radiation based magnetic imaging and high-resolution transmission electron microscopy we reveal systematic correlations between the magnetic switching field and the internal nanoscale structure of individual islands in bit patterned media fabricated by...

  • Concentration of neutral oxygen vacancies in buried oxide formed by implantation of oxygen. Seol, Kwang Soo; Futami, Tsuyoshi; Ohki, Yoshimichi // Journal of Applied Physics;2/15/1998, Vol. 83 Issue 4, p2357 

    Provides information on an experiment using synchrotron radiation as a photon source to obtained photoluminescence spectra for buried oxide formed by implantation of oxygen. Methodology used to conduct the experiment; Results of the experiment.

  • Investigation of interface morphology and compostion mixing in CdTe/CdS heterojunction... Soo, Y.L.; Huang, S.; Kao, Y.H.; Compaan, A.D. // Journal of Applied Physics;4/15/1998, Vol. 83 Issue 8, p4173 

    Provides information on an experimental study using synchroton radiation to investigate interface morphology and composition mixing in CdTe/CdS heterojunction photovoltaic materials. Methodology used to conduct the experiment; Information on grazing incidence x-ray scattering (GIXS)...

  • Conceptual design of SPring-8 front ends. Sakurai, Y.; Oura, M.; Sekae, H.; Usui, T.; Kimuri, H.; Oikawa, Y.; Kitamura, H.; Konishi, T.; Shiwaku, H.; Nakamura, A.; Amamoto, H.; Harami, T. // Review of Scientific Instruments;Feb1995, Vol. 66 Issue 2, p1771 

    Describes the design philosophy and conceptual layout of the front ends of the SPring-8 synchrotron radiation facility under construction in Japan. Arrangements and components of the front ends; Use of graphite filters to cut the low energy part of the synchrotron radiation.

  • Europe open new era in synchrotron research. Butler, Declan // Nature;10/6/1994, Vol. 371 Issue 6497, p469 

    Reports on the opening of the European Synchrotron Radiation Facility (ESRF) in Grenoble, France. Third generation synchrotrons which produce fine beams of X-rays at chosen wavelengths; Development of synchrotron radiation since 1947; Comparison with conventional X-rays; Popularity of...

  • New RIE plasma source may aid DESIRE process. K.D. // Solid State Technology;Mar95, Vol. 38 Issue 3, p26 

    Presents the results of a study evaluating an alternative plasma source that may aid the surface mount process for making semiconductors. Improvement in etch performance and residue formation; Solution to the conflict between increased lithographic resolution and reduced depth of focus;...

  • Influence of a finite energy width on the hot electron double-slit interference experiment: A... Hongo, Hiroo; Miyamoto, Yasuyuki; Gault, Michael; Furuya, Kazuhito // Journal of Applied Physics;10/15/1997, Vol. 82 Issue 8, p3846 

    Investigates the influence of electron energy width in the hot electron double-slit experiment in a semiconductor. Influence of finite energy width of the electron wave to double-slit experiment; Current-voltage characteristics of the graded emitter diode.

  • Semiconductor manufacturers look to short wavelengths. Lewotsky, Kristin // Laser Focus World;Jul97, Vol. 33 Issue 7, p82 

    Reports on the efforts of semiconductor manufacturers to bring production-level 193-nm litography online. Organization of American efforts through an industry consortium; Production of small-field steppers for photoresist development.

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics