TITLE

Sulfurization of SiO[sub 2] surface for polycrystalline silicon growth on SiO[sub 2]/Si

AUTHOR(S)
Wang, K.C.; Hwang, H.L.
PUB. DATE
February 1994
SOURCE
Applied Physics Letters;2/21/1994, Vol. 64 Issue 8, p1024
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the sulfurization of silica (SiO[sub 2]) for the growth of silicon (Si)/SiO[sub 2]/Si structures. Deposition of Si films by plasma enhanced chemical vapor deposition; Appearance of amorphous Si layer between SiO[sub 2] and Si films; Absence of amorphous Si layer in samples deposited with sulfur.
ACCESSION #
4266386

 

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