TITLE

Selectivity in copper chemical vapor deposition

AUTHOR(S)
Cohen, Susan L.; Liehr, Michael
PUB. DATE
March 1992
SOURCE
Applied Physics Letters;3/30/1992, Vol. 60 Issue 13, p1585
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Determines the fundamental surface chemistry underlying the selective behavior of two copper chemical vapor deposition precursors. Influence of electrochemical contribution on oxide precursor reactivity to metal surface; Role of surface preparation and cleaning in selective deposition initiation; Use of x-ray photoelectron spectroscopy.
ACCESSION #
4266341

 

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