Selectivity in copper chemical vapor deposition

Cohen, Susan L.; Liehr, Michael
March 1992
Applied Physics Letters;3/30/1992, Vol. 60 Issue 13, p1585
Academic Journal
Determines the fundamental surface chemistry underlying the selective behavior of two copper chemical vapor deposition precursors. Influence of electrochemical contribution on oxide precursor reactivity to metal surface; Role of surface preparation and cleaning in selective deposition initiation; Use of x-ray photoelectron spectroscopy.


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