TITLE

Analytical solution of thickness variations in selective area growth by organometallic chemical vapor deposition

AUTHOR(S)
Liu, X.; Aspnes, D. E.
PUB. DATE
June 2009
SOURCE
Applied Physics Letters;6/22/2009, Vol. 94 Issue 25, p253112
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Using conformal mapping, we derive an analytic expression for the thickness d of a deposited film as a function of the distance r from a mask edge in selective area growth by organometallic chemical vapor deposition (OMCVD). Adjacent to the mask d∼r-1/2, which is clearly different from the exponential dependence observed for large planar surfaces. The result provides a means of distinguishing growth mechanisms in OMCVD.
ACCESSION #
42642382

 

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