Analytical solution of thickness variations in selective area growth by organometallic chemical vapor deposition

Liu, X.; Aspnes, D. E.
June 2009
Applied Physics Letters;6/22/2009, Vol. 94 Issue 25, p253112
Academic Journal
Using conformal mapping, we derive an analytic expression for the thickness d of a deposited film as a function of the distance r from a mask edge in selective area growth by organometallic chemical vapor deposition (OMCVD). Adjacent to the mask d∼r-1/2, which is clearly different from the exponential dependence observed for large planar surfaces. The result provides a means of distinguishing growth mechanisms in OMCVD.


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