TITLE

Manipulation of the Ti/Si reaction paths by introducing an amorphous Ge interlayer

AUTHOR(S)
Ma, Z.; Xiao, H.Z.
PUB. DATE
August 1994
SOURCE
Applied Physics Letters;8/1/1994, Vol. 65 Issue 5, p561
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the evolution of the Ti/a-Ge/Si trilayer reactions using transmission electron microscopy and Auger electron spectroscopy. Manipulation of the Ti/Si reaction paths; Introduction of an amorphous Ge interlayer; Correlation between reaction path and the change in film resistance.
ACCESSION #
4258418

 

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