TITLE

Nitrogen content of oxynitride films on Si(100)

AUTHOR(S)
Tang, H.T.; Lennard, W.N.
PUB. DATE
June 1994
SOURCE
Applied Physics Letters;6/20/1994, Vol. 64 Issue 25, p3473
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Determines the absolute nitrogen concentration in SiO[sub x]N[sub y]/Si films by nuclear reaction analysis. Comparison of the nuclear reaction to other surface analysis methods; Analysis of silicon oxynitride films prepared under various conditions; Location of the nitrogen accumulation.
ACCESSION #
4258390

 

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