Silicon dioxide thin films prepared by chemical vapor deposition from

Maruyama, Toshiro; Ohtani, Satoshi
May 1994
Applied Physics Letters;5/23/1994, Vol. 64 Issue 21, p2800
Academic Journal
Examines the properties of silicon dioxide thin films prepared by chemical vapor deposition. Source materials for obtaining the films; Use of multipurpose recording spectrometer to measure the ozone concentration; Details of the chemical stability, dynamic hardness and infrared absorption spectra of the films.


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