TITLE

Effects of microstructure on transport properties of undoped hydrogenated amorphous silicon films

AUTHOR(S)
Dawson, R.M.A.; Fortmann, C.M.
PUB. DATE
August 1993
SOURCE
Applied Physics Letters;8/16/1993, Vol. 63 Issue 7, p955
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the effect of deposition temperature altered microstructure and void fraction on the electronic transport properties of undoped hydrogenated amorphous silicon materials. Reduction in the sample hydrogen content; Photo and dark conductivities of silicon; Behavior of the material room temperature mobilities.
ACCESSION #
4258250

 

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