TITLE

Influence of deposition pressure on the output characteristics of low pressure chemical vapor

AUTHOR(S)
Dimitriadis, C.A.; Coxon, P.A.
PUB. DATE
August 1993
SOURCE
Applied Physics Letters;8/16/1993, Vol. 63 Issue 7, p943
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the influence of deposition pressure on the output characteristics of low pressure chemical vapor deposited polycrystalline silicon thin film transistors. Dominance of grain boundaries in the device conventional output; Behavior of the kink effect observed in short-channel devices; Electric field capacity of the materials.
ACCESSION #
4258246

 

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