Condensed chlorine etching of GaAs induced by excimer laser radiation

Shih, M.C.; Freiler, M.B.
August 1992
Applied Physics Letters;8/17/1992, Vol. 61 Issue 7, p828
Academic Journal
Explores the condensed chlorine etching of gallium arsenide surfaces induced by excimer laser radiation. Demonstration of spatially well-resolved, anisotropic etching; Characterization of the etch rate; Proposal of a model describing the etching mechanism.


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