TITLE

Condensed chlorine etching of GaAs induced by excimer laser radiation

AUTHOR(S)
Shih, M.C.; Freiler, M.B.
PUB. DATE
August 1992
SOURCE
Applied Physics Letters;8/17/1992, Vol. 61 Issue 7, p828
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Explores the condensed chlorine etching of gallium arsenide surfaces induced by excimer laser radiation. Demonstration of spatially well-resolved, anisotropic etching; Characterization of the etch rate; Proposal of a model describing the etching mechanism.
ACCESSION #
4258199

 

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