Silicon-fluorine bonding and fluorine profiling in SiO[sub 2] films grown by NF[sub 3]-enhanced

Kouvatsos, D.; McCluskey, F.P.
August 1992
Applied Physics Letters;8/17/1992, Vol. 61 Issue 7, p780
Academic Journal
Observes fluorine bonding in fluorinated silicon dioxide grown by NF[sub 3-] enhanced oxidation of silicon. Generation of high resolution photoelectron spectra of the silicon 2p peak region; Effect of bond strain gradient reduction on metal-oxide-semiconductor; Reduction of oxide mechanical stress on very large scale integration microelectronic circuits.


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