TITLE

New approach to the preparation of ultrathin silicon dioxide films at low temperatures

AUTHOR(S)
Xueping Xu; Goodman, D.W.
PUB. DATE
August 1992
SOURCE
Applied Physics Letters;8/17/1992, Vol. 61 Issue 7, p774
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents an approach to the preparation of ultrathin silica films at low temperatures. Comparison of the properties of the chambers used in the experiment; Techniques used in characterizing the films; Description of the electronic properties of the films.
ACCESSION #
4258181

 

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