New approach to the preparation of ultrathin silicon dioxide films at low temperatures

Xueping Xu; Goodman, D.W.
August 1992
Applied Physics Letters;8/17/1992, Vol. 61 Issue 7, p774
Academic Journal
Presents an approach to the preparation of ultrathin silica films at low temperatures. Comparison of the properties of the chambers used in the experiment; Techniques used in characterizing the films; Description of the electronic properties of the films.


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