Conformal deposition of WSi[sub x] films on micron-sized trenches: The reactivity of film

Saito, T.; Shimogaki, Y.
August 1992
Applied Physics Letters;8/17/1992, Vol. 61 Issue 7, p764
Academic Journal
Investigates the chemical vapor deposition of tungsten silicide films on micron-sized trenches. Superiority of the properties of the films; Evaluation of the residual concentration of fluorine; Determination of the composition of the film using the Rutherford backscattering spectroscopy.


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