TITLE

Conformal deposition of WSi[sub x] films on micron-sized trenches: The reactivity of film

AUTHOR(S)
Saito, T.; Shimogaki, Y.
PUB. DATE
August 1992
SOURCE
Applied Physics Letters;8/17/1992, Vol. 61 Issue 7, p764
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the chemical vapor deposition of tungsten silicide films on micron-sized trenches. Superiority of the properties of the films; Evaluation of the residual concentration of fluorine; Determination of the composition of the film using the Rutherford backscattering spectroscopy.
ACCESSION #
4258177

 

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