Diamond growth by a new method based upon sequential exposure to atomic carbon and hydrogen

Kelly, Michael A.; Olson, Darin S.
May 1992
Applied Physics Letters;5/18/1992, Vol. 60 Issue 20, p2502
Academic Journal
Demonstrates diamond film growth using a method based upon sequential exposure to atomic hydrogen and carbon. Description of the chemical vapor deposition reactor; Enumeration of film samples grown in the reactor; Implication of the sequential process for diamond growth.


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