TITLE

Change in crystalline morphologies of polycrystalline silicon films prepared by radio-frequency

AUTHOR(S)
Kaneko, Toshiki; Wakagi, Masatoshi
PUB. DATE
April 1994
SOURCE
Applied Physics Letters;4/4/1994, Vol. 64 Issue 14, p1865
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the deposition of polycrystalline silicon films on glass substrates by plasma-enhanced chemical vapor deposition. Effects of gas pressure on film structure; Microcrystallization of silicon films by heavy dilution of SiH[sub 4] with H[sub 2]; Control of crystal nucleation to obtain polycrystalline silicon films.
ACCESSION #
4255106

 

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