Phase transition of Cu/Si system obtained by ion beam assisted deposition

Jie Yang; Zhang, H.B.
April 1994
Applied Physics Letters;4/4/1994, Vol. 64 Issue 14, p1800
Academic Journal
Examines the formation of copper (Cu) films on silicon (Si) substrates. Use of physical vapor deposition for Cu films; Formation of copper silicide (Cu[sub 15]Si[sub 15]) at Cu film interface; Comparison of the phase sequence in Cu-Si system between the experiment and annealing process.


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