Enhanced methyl-radical production in an Ar-CH[sub 4] pin-hollow cathode discharge

Iizuka, S.; Takada, T.
April 1994
Applied Physics Letters;4/4/1994, Vol. 64 Issue 14, p1786
Academic Journal
Examines the enhanced methyl-radical formation in Ar-Ch[sub 4] discharged plasma. Effects of electron temperature on methyl-radical formation; Use of pin-hollow cathode for methyl-radicals; Estimate of the methyl radical density by quadrupole mass spectroscopy.


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