Fluorine-enhanced oxidation of polycrystalline silicon and application to thin-film transistor

Kouvatsos, Dimitrios N.; Hatalis, Miltiadis K.
August 1992
Applied Physics Letters;8/24/1992, Vol. 61 Issue 8, p937
Academic Journal
Investigates the kinetics of the fluorinated oxidation of polycrystalline silicon and application to thin-film transistor fabrication. Growth of the silicon dioxide; Application of fluorinated gate oxides in the fabrication of thin-film transistors; Improvement of effective electron mobility.


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