TITLE

Fluorine-enhanced oxidation of polycrystalline silicon and application to thin-film transistor

AUTHOR(S)
Kouvatsos, Dimitrios N.; Hatalis, Miltiadis K.
PUB. DATE
August 1992
SOURCE
Applied Physics Letters;8/24/1992, Vol. 61 Issue 8, p937
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the kinetics of the fluorinated oxidation of polycrystalline silicon and application to thin-film transistor fabrication. Growth of the silicon dioxide; Application of fluorinated gate oxides in the fabrication of thin-film transistors; Improvement of effective electron mobility.
ACCESSION #
4254960

 

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