Thermal stability of Si/Si[sub 1-x]Ge[sub x]/Si heterostructures deposited by very low pressure

Syun-Ming Jang; Hyoun-Woo Kim
July 1992
Applied Physics Letters;7/20/1992, Vol. 61 Issue 3, p315
Academic Journal
Examines the thermal stability of matastable silicon/Si[sub 1-x]Ge[sub x]/Si strained structures deposited by chemical vapor deposition. Determination of the residual strain and misfit dislocation structure; Transition and different mechanisms in the relaxation process; Details on the silicon-germanium interdiffusion.


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