TITLE

Use of electron-beam charging for in-process inspection of silicide complementary

AUTHOR(S)
Jenkins, K.A.; Agnello, P.D.
PUB. DATE
July 1992
SOURCE
Applied Physics Letters;7/20/1992, Vol. 61 Issue 3, p312
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Demonstrates the inspection of complementary metal-oxide-semiconductor circuits by electron-beam charging. Verification on the isolation of the gate electrodes used in the circuits; Nonremoval of the wafers from the clean room; Deposition of the insulating dielectrics and subsequent metal to silicide bridge.
ACCESSION #
4254916

 

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