TITLE

Ultraviolet-induced annealing of hydrogen bonds in silica films deposited at low temperatures

AUTHOR(S)
Debauche, C.; Licoppe, C.
PUB. DATE
July 1992
SOURCE
Applied Physics Letters;7/20/1992, Vol. 61 Issue 3, p306
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the exposure of photodeposited silica to ultraviolet irradiation with wavelengths causing full removal of silicon--H bonds. Occurrence of photoreaction; Independence of photoreaction to the film thickness; Involvement of water groups in the silica thin films; Description of the ultraviolet effect.
ACCESSION #
4254914

 

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