Degradation by electromigration in passivated Al-1 wt% Si thin films

Li, Z.; Bauer, C.L.
July 1992
Applied Physics Letters;7/20/1992, Vol. 61 Issue 3, p276
Academic Journal
Examines the time evolution of the fractional change of electrical resistance of passivated aluminum-1 silicon thin-film conductors. Stages characterizing the thin-film conductor time evolution; Components and attachment of each conductor; Generation of tensile and compressive stress near grain boundary triple junctions.


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